Exposed nitride is then etched away

Making an Integrated Circuit
24/07/2017 0 min

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Let's go inside an Intel 4004 microprocessor to see an individual transistor 24/07/2017
To make this transistor, first oxide then nitride layers are grown 24/07/2017
A shadow mask then exposes a photographic emulsion 24/07/2017
Oxygen reacts with the Si to grow more oxide 24/07/2017
By heating in silane, polycrystal Si is then grown 24/07/2017
A stripe is exposed in a second photographic emulsion 24/07/2017
Exposed polycrystal Si is etched away leaving the transistor gate 24/07/2017
Phosphorus ions then penetrate thin oxide to create the source and drain 24/07/2017
Heating in oxygen grows an insulating coat on the gate 24/07/2017
A third photographic emulsion defines windows above the source and drain 24/07/2017
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